High-k And CVD ALD Metal Precursors Market Expected to Deliver Dynamic Progression until By 2028

 High-k And CVD ALD Metal Precursors Market Growth & Trends

The global high-k and CVD ALD metal precursors market size is projected to reach USD 761.1 million by 2028, registering a CAGR of 6.2% from 2021 to 2028, according to a new report by Grand View Research, Inc. The trend of miniaturization of semiconductor and electronic devices and the need for enhancing their performance is expected to drive the market growth.

Atomic Layer Deposition (ALD) is the subclass of the Chemical Vapor Deposition (CVD) process, which is used to manufacture thin films. The ALD method is used for depositing multi-component thin films by co-injecting precursors, such as Hf and Si, for forming a single-layer homogenous film used in several applications, such as self-aligned patterning, 3D NAND, and FinFET. The ALD process can create metal as well as dielectric films based on the precursor requirements.

Insulator materials with high dielectric constant (k) play a vital role in modern semiconductor devices and are used for insulating gates from channels in transistors and decoupling filter capacitors to protect microcircuits from unwanted noise. They are also used in the capacitors that store memory bits in DRAM. Moreover, high-k and ALD/CVD metal precursors play a crucial role in Very-Large-Scale Integration (VLSI) technology and scaling of semiconductor devices to 10 nm and beyond nodes. High-k insulators are required to maintain the capacitance of smaller semiconductor devices.

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High-k And CVD ALD Metal Precursors Market Report Highlights

• The interconnect segment accounted for the largest share of the market in 2020 and is expected to reach over USD 343.5 million by 2028
• Asia Pacific dominated the market in 2020 and is expected to register the highest CAGR over the forecast period owing to the high demand for high-k and ALD/CVD metal precursors and rapid growth of the electronics industry in China, India, and other Southeast Asian countries
• Some of the key companies in the market include Air Liquide; Air Products & Chemicals, Inc.; Praxair; Linde; and Dow Chemical

Access Press Release@ https://www.grandviewresearch.com/press-release/global-high-k-and-ald-cvd-metal-precursors-market

High-k And CVD ALD Metal Precursors Market Segmentation

Grand View Research has segmented the global high-k and CVD ALD metal precursors market based on technology and region:

High-k And CVD ALD Metal Precursors Technology Outlook (Revenue, USD Million, 2018 - 2028)

• Interconnect
• Capacitors
• Gates

High-k And CVD ALD Metal Precursors Regional Outlook (Revenue, USD Million, 2018 - 2028)

• North America
  • US.
  • Canada
• Europe
  • UK.
  • Germany
• Asia Pacific
  • China
  • India
  • Japan
• Latin America
  • Brazil
  • Mexico
• Middle East & Africa

List of Key Players of the High-k And CVD ALD Metal Precursors Market

• Air Liquide
• Air Products & Chemicals, Inc.
• Praxair
• Linde
• Dow Chemical

About Grand View Research

Grand View Research, Inc. is a U.S. based market research and consulting company, registered in the State of California and headquartered in San Francisco. The company provides syndicated research reports, customized research reports, and consulting services. To help clients make informed business decisions, we offer market intelligence studies ensuring relevant and fact-based research across a range of industries, from technology to chemicals, materials and healthcare.